Dry film photoresists ‐ a never ending success story?
Klaus Maurischat
(Klaus Maurischat Consulting and Project Management, Staufen, Germany)
313
Abstract
Reviews the use and development of dry film photoresists and liquid resists. Provides an historical perspective and considers factors affecting investment in the future. Discusses both the advantages and limitations of dry film and liquid photoresists. Provides an outlook for future developments.
Keywords
Citation
Maurischat, K. (1998), "Dry film photoresists ‐ a never ending success story?", Circuit World, Vol. 24 No. 2, pp. 34-37. https://doi.org/10.1108/03056129810198197
Publisher
:MCB UP Ltd
Copyright © 1998, Company