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A detection and control method of resin liquid‐level of stereolithography apparatus

Yiqing Wang (State Key Laboratory for Manufacturing Systems Engineering, School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, China)
Wanhua Zhao (State Key Laboratory for Manufacturing Systems Engineering, School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, China)
Yucheng Ding (State Key Laboratory for Manufacturing Systems Engineering, School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, China)
Zhongyun He (State Key Laboratory for Manufacturing Systems Engineering, School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, China)
Bingheng Lu (State Key Laboratory for Manufacturing Systems Engineering, School of Mechanical Engineering, Xi'an Jiaotong University, Xi'an, China)

Rapid Prototyping Journal

ISSN: 1355-2546

Article publication date: 25 September 2009

652

Abstract

Purpose

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The purpose of this paper is to detect and control the liquid‐level of stereolithography apparatus precisely.

Design/methodology/approach

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A brightness‐variable laser source is adopted to remove the computational error of divider and a closed‐loop circuit is set to measure the terminal voltage directly proportional to the output current of photosensitive devices. It employs a sinking‐block device to control the liquid‐level.

Findings

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The precise calibration result of this detecting device indicates that the resolution of the liquid‐level detection can reach ±1.5 μm.

Originality/value

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This sinking‐block style liquid‐level control device can allow for the liquid‐level wave reduced from ±45 to ±15 μm.

Keywords

Citation

Wang, Y., Zhao, W., Ding, Y., He, Z. and Lu, B. (2009), "A detection and control method of resin liquid‐level of stereolithography apparatus", Rapid Prototyping Journal, Vol. 15 No. 5, pp. 333-338. https://doi.org/10.1108/13552540910993851

Publisher

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Emerald Group Publishing Limited

Copyright © 2009, Emerald Group Publishing Limited

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