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Multi‐layer thick‐film microwave components and measurements

Zhengrong Tian (Heraeus Circuit Materials Division, West Conshohocken, PA, USA)
Charles Free (Heraeus Circuit Materials Division, West Conshohocken, PA, USA)
Colin Aitchison (Heraeus Circuit Materials Division, West Conshohocken, PA, USA)
Peter Barnwell (Heraeus Circuit Materials Division, West Conshohocken, PA, USA)
James Wood (Heraeus Circuit Materials Division, West Conshohocken, PA, USA)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 April 2003

413

Abstract

The trend in wireless and mobile communications for broader bandwidth microwave circuitry, coupled with high packaging density and low cost fabrication has triggered investigations of new circuit configurations and technologies that meet these requirements. We have addressed these issues through the study of multilayer microwave structures using advanced thick‐film technology. The techniques described employ several layers of metal sandwiched by thick‐film dielectric. This leads to an efficient solution for system miniaturisation. The significance of this work is that it shows the multilayer approach to microwave structures, coupled with new thick‐film technology, offers a viable and economic solution to achieve high‐density, high‐performance microwave circuits.

Keywords

Citation

Tian, Z., Free, C., Aitchison, C., Barnwell, P. and Wood, J. (2003), "Multi‐layer thick‐film microwave components and measurements", Microelectronics International, Vol. 20 No. 1, pp. 17-20. https://doi.org/10.1108/13565360310455472

Publisher

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MCB UP Ltd

Copyright © 2003, MCB UP Limited

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