Research on the WIP‐based Dispatching Rules for Photolithography Area in Wafer Fabrication Industries

Abstract

Constructing an effective production control policy is the most important issue in wafer fabrication factories. Most of researches focus on the input regulations of wafer fabrication. Although many of these policies have been proven to be effective for wafer fabrication manufacturing, in practical, there is a need to help operators decide which lots should be pulled in the right time and to develop a systematic way to alleviate the long queues at the bottleneck workstation. The purpose of this study is to construct a photolithography workstation dispatching rule (PADR). This dispatching rule considers several characteristics of wafer fabrication and influential factors. Then utilize the weights and threshold values to design a hierarchical priority rule. A simulation model is also constructed to demonstrate the effect of the PADR dispatching rule. The PADR performs better in throughput, yield rate, and mean cycle time than FIFO (First‐In‐First‐Out) and SPT (Shortest Process Time).

Citation

Lin, Y., Tsai, C., Lee, C. and Chiu, C. (2007), "Research on the WIP‐based Dispatching Rules for Photolithography Area in Wafer Fabrication Industries", Asian Journal on Quality, Vol. 8 No. 2, pp. 145-159. https://doi.org/10.1108/15982688200700020