Photosensitive Resist Printing

Abstract

In this series of articles on printed circuit troubleshooting, the author in this issue of the journal focuses his attention on photoresists. The problems that most commonly occur during lamination, film development, subsequent plating processes, coating consistency, resist exposure and development are detailed.

Citation

Shemilt, H.R. (1975), "Photosensitive Resist Printing", Circuit World, Vol. 1 No. 2, pp. 9-12. https://doi.org/10.1108/eb043512