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Nanoscale processes simulated by transforms and image processing methods

1 Electronics Engineering Department, Holon Institute of Technology, Holon, 58102, 52 Golomb St., Israel
2 Hadassah Academic College, Jerusalem 37 Hanevi'im st. P. O. Box 1114, Jerusalem

World Journal of Engineering

ISSN: 1708-5284

Article publication date: 19 February 2013

56

Abstract

A simulation method was developed to display images of nano-particles and their dynamic 2D growth on surfaces, due to mechanisms such as adsorption, diffusion and coalescence. In this method a mathematical Fourier frequency tranforms (FT) of a 2D image density functions representing the nanostructure and image processing are combined to obtain a continuos visualization of thin film depositon process. These images are then convoluted using FT of spatiotemporal integrodifferential equations involving the physical driving forces models in the frequency domain. Using an appropriate prediction models we were able to solve the spatiotemporal evolutional equations. Thus the surface growth and restructuring effects taking place during the photo-deposition processes were investigated. In particular, the dynamic changes of the photo-deposited nanoparticles morphology during sub-monolayer growth were simulated. The simulation and scanning electron microscopy (SEM) micrographs of a-Se photo deposited thin films during monolayer formation were discuussed and were found to be good accordance and complementary.

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Citation

Mirchin, N., Peled, A. and Azoulay, J. (2013), "Nanoscale processes simulated by transforms and image processing methods", World Journal of Engineering, Vol. 10 No. 1, pp. 1-10. https://doi.org/10.1260/1708-5284.10.1.1

Publisher

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Emerald Group Publishing Limited

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