Electrochemical and photoelectrochemical study of the self-assembled monolayer phytic acid on cupronickel B30

Qun-Jie Xu; Zong-Yue Wan; Guo-Ding Zhou; Ren-He Yin; Wei-Min Cao

doi:10.1108/00035590910940087

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Anti-Corrosion Methods and Materials

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Electrochemical and photoelectrochemical study of the self-assembled monolayer phytic acid on cupronickel B30

Document Information:
Title:	Electrochemical and photoelectrochemical study of the self-assembled monolayer phytic acid on cupronickel B30
Author(s):	Qun-Jie Xu, (Department of Environment Engineering, Shanghai University of Electric Power, Shanghai, China), Zong-Yue Wan, (Department of Environment Engineering, Shanghai University of Electric Power, Shanghai, China Department of Chemistry, Shanghai University, Shanghai, China), Guo-Ding Zhou, (Department of Environment Engineering, Shanghai University of Electric Power, Shanghai, China), Ren-He Yin, (Department of Chemistry, Shanghai University, Shanghai, China), Wei-Min Cao, (Department of Chemistry, Shanghai University, Shanghai, China)
Citation:	Qun-Jie Xu, Zong-Yue Wan, Guo-Ding Zhou, Ren-He Yin, Wei-Min Cao, (2009) "Electrochemical and photoelectrochemical study of the self-assembled monolayer phytic acid on cupronickel B30", Anti-Corrosion Methods and Materials, Vol. 56 Iss: 2, pp.95 - 102
Keywords:	Acids, Alloys, Corrosion, Surface properties of materials
Article type:	Research paper
DOI:	10.1108/00035590910940087 (Permanent URL)
Publisher:	Emerald Group Publishing Limited
Acknowledgements:	The authors acknowledge the financial support from the National Natural Science Foundation of China (20406009); Key Project of Shanghai Education Committee (06ZZ67); Key Project of Shanghai Committee of Science and Technology (062312045); Opening Project of National Key Laboratory for Physical Chemistry of Solid Surface in Xiamen University (200512); and the Key Discipline of Shanghai Education Committee of China (P1304).
Abstract:	Purpose – The purpose of this paper is to investigate the self-assembled monolayers (SAMs) of phytic acid on cupronickel B30 surface of anticorrosion and inhibiting mechanisms. Design/methodology/approach – Electrochemical and photocurrent response methods were performed to determine the effect of phytic acid SAMs on cupronickel B30. Findings – The results indicated that phytic acid was liable to interact with B30 as a result of formation of complexes on B30 surface for anti-rust and anti-corrosion. The SAMs changed the structure of the electrochemical double layer and made the value of double layer capacitance decrease significantly. The B30 electrode showed p-type photoresponse, which came from Cu2O layer on its surface. The photoresponse decreased greatly due to the SAMs of phytic acid as the corrosion resisting property was enhanced. This finding was in good agreement with the results obtained from EIS and polarization curves. Adsorption of phytic acid was found to follow the Langmuir adsorption isotherm and the adsorption mechanism was typical of chemisorption. Originality/value – The SAMs of phytic acid on cupronickel B30 was gained for the first time. The photo-electrochemical method was an in situ method, which was effective for characterizing optical and electronic properties of passive films.