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Modelling and optimisation study on the fabrication of nano‐structures using imprint forming process

Stoyan Stoyanov (Centre for Numerical Modelling and Process Analysis, University of Greenwich, London, UK)
Tim Tilford (Centre for Numerical Modelling and Process Analysis, University of Greenwich, London, UK)
Farid Amalou (MicroSystems Engineering Centre, School of Engineering and Physical Sciences, Heriot‐Watt University, Edinburgh, UK)
Scott Cargill (MicroSystems Engineering Centre, School of Engineering and Physical Sciences, Heriot‐Watt University, Edinburgh, UK)
Chris Bailey (Centre for Numerical Modelling and Process Analysis, University of Greenwich, London, UK)
Marc Desmulliez (MicroSystems Engineering Centre, School of Engineering and Physical Sciences, Heriot‐Watt University, Edinburgh, UK)

Engineering Computations

ISSN: 0264-4401

Article publication date: 4 January 2011

350

Abstract

Purpose

Nano‐imprint forming (NIF) is a manufacturing technology capable of achieving high resolution, low‐cost and high‐throughput fabrication of fine nano‐scale structures and patterns. The purpose of this paper is to use modelling technologies to simulate key process steps associated with the formation of patterns with sub‐micrometer dimensions and use the results to define design rules for optimal imprint forming process.

Design/methodology/approach

The effect of a number of process and pattern‐related parameters on the quality of the fabricated nano‐structures is studied using non‐linear finite element analysis. The deformation process of the formable material during the mould pressing step is modelled using contact analysis with large deformations and temperature dependent hyperelastic material behaviour. Finite element analysis with contact interfaces between the mould and the formable material is utilised to study the formation of mechanical, thermal and friction stresses in the pattern.

Findings

The imprint pressure, temperature and the aspect ratio of grooves which define the pattern have significant effect on the quality of the formed structures. The optimal imprint pressure for the studied PMMA is identified. It is found that the degree of the mould pattern fulfilment as function of the imprint pressure is non‐linear. Critical values for thermal mismatch difference in the CTE between the mould and the substrate causing thermally induced stresses during cooling stage are evaluated. Regions of high stresses in the pattern are also identified.

Originality/value

Design rules for minimising the risk of defects such as cracks and shape imperfections commonly observed in NIF‐fabricated nano‐structures are presented. The modelling approach can be used to provide insights into the optimal imprint process control. This can help to establish further the technology as a viable route for fabrication of nano‐scale structures and patterns.

Keywords

Citation

Stoyanov, S., Tilford, T., Amalou, F., Cargill, S., Bailey, C. and Desmulliez, M. (2011), "Modelling and optimisation study on the fabrication of nano‐structures using imprint forming process", Engineering Computations, Vol. 28 No. 1, pp. 93-111. https://doi.org/10.1108/02644401111097046

Publisher

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Emerald Group Publishing Limited

Copyright © 2011, Emerald Group Publishing Limited

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