Scribe and break 100-3 for delicate wafers

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 August 2002

49

Keywords

Citation

(2002), "Scribe and break 100-3 for delicate wafers", Microelectronics International, Vol. 19 No. 2. https://doi.org/10.1108/mi.2002.21819bad.005

Publisher

:

Emerald Group Publishing Limited

Copyright © 2002, MCB UP Limited


Scribe and break 100-3 for delicate wafers

Scribe and break 100-3 for delicate wafers

Keyword: PESL

The Scribe 100-3 is another machine from Production Equipment Sales Limited (PESL) developed for the new generation of delicate die wafers. High accuracy (1µm resolution) and programmable scribing parameters make it ideal for optical applications such as laser diodes, using Galium Arsonide or Silicon substrates.

Wafer sizes of up to 3" and thickness of 100µm upwards can be accommodated to produce die of 200µm plus. The scribing force is set at a stable low level with programmable speed control and programmable break speed. Indeed the scribe and break parameters are entirely accessible in order to define, step by step, the full scribing sequence. They may then be saved for each customised product (Plate 4).

Plate 4

For contamination control purposes the 100-3 uses a bottom knife and replaceable top nylon film which also allows clean breaking and optimised operational quality. Further information may be found at http://www.pesl.win-uk.net .

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