Citation
(2003), "Abbreviations", Pigment & Resin Technology, Vol. 32 No. 1. https://doi.org/10.1108/prt.2003.12932aae.001
Publisher
:Emerald Group Publishing Limited
Copyright © 2003, MCB UP Limited
Abbreviations
AODD Air operated double diaphragmCIR Carbon infra-redCMC Critical micelle concentrationCNSL Cashew nut shell liquidCPE Constant phase elementsCPVC Critical pigment volume concentrationDOI Distinctness of imageDLS Dynamic light scatteringDMTA Dynamic-mechanical thermal analysisDSC Differential scanning calorimeterEEW Epoxy equivalent weightEIS Electrochemical impedance spectroscopyENM Electrochemical noise measurementEPPC Electrophoretic protective and cosmetic coatingsESR Electron spin resonanceFAB Fast atom bombardmentFD Fraunhofer diffractionFSP Fibre saturation pointFTIR Fourier transform infra-red spectroscopy1H NMR Proton nuclear magnetic resonanceHiW Heats of immersion in waterHLB Hdyrophile lipophile balanceHPT Heat polymerisation timeIPC Integrated pollution controlIR Infra redPCS Photon correlation spectroscopyPdi Polydispersity indexPPC Pollution prevention and controlPVC/CPVC Pigment volume concentration/critical pigment volume concentrationPVC Pigment volume concentrationLCP Liquid crystalline polymersLDA Linear diode arrayLER Liquid epoxide resinLEV Local exhaust ventilationNIR Near infra-red spectrophotometryNUVC Numerical UV controlOCP Open-circuit corrosion potentialQELS Quasi-elastic light scatteringSCE Saturated calomel electrodeSCE Specular control excludedSCI Specular control includedSDP Size distribution processingSEM Scanning electron microscopySBP Single-base propellantsSPC Self-polishing copolymersSR Sedimentation rateSV Sediment volumeTEM Transmission electron microscopyTGA Thermogravimetric analysisTIP Total inhalable particulateTRMs Thickness and rheology modifiersUV Ultra violetVOCs Volatile organic compoundsWVS Water vapour sorptionXRD X-ray diffractionXRF X-ray fluorescence