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Modeling of Deformations of Photolithographic Objects

A. Touati (DCPR‐CNRS‐ENSIC‐INPL)
S. Corbel (DCPR‐CNRS‐ENSIC‐INPL)
J.P. Corriou (LSGC‐CNRS‐ENSIC‐INPL, 1 rue Grandville, BP 20451 54001 Nancy Cedex)

Multidiscipline Modeling in Materials and Structures

ISSN: 1573-6105

Article publication date: 1 January 2008

67

Abstract

Photolithography allows the fabrication of a solid polymer object through polymerization of a monomer resin by means of a laser source guided according to the data of computer aided design. However, one drawback of this method is the inaccuracy of the dimensions of the objects related to the shrinkage phenomenon which depends on the polymerization, on the laser flux and on the used sweeping procedure. In this paper, the deformation of an isolated voxel (elementary volume) or a voxel interacting with its neighbor is described. This simulation is based on a kinetic model that takes into account the gel effect and a model of volumetric variation due to the difference of the length of the bonds between the monomer and polymer molecules.

Keywords

Citation

Touati, A., Corbel, S. and Corriou, J.P. (2008), "Modeling of Deformations of Photolithographic Objects", Multidiscipline Modeling in Materials and Structures, Vol. 4 No. 1, pp. 89-104. https://doi.org/10.1163/157361108783470414

Publisher

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Emerald Group Publishing Limited

Copyright © 2008, Emerald Group Publishing Limited

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