Microelectronics International: Volume 40 Issue 4

Subject:

Table of contents

Model of boron diffusion in silicon used for solar cell fabrication based on boric acid solutions

Wojciech Filipowski

The purpose of this paper is to develop a model that allows determining the boron concentration profile in silicon based on duration and temperature of the diffusion process.

Improving displacement of silicon V-shaped electrothermal microactuator using platinum sputter deposition process

Dzung Tien Nguyen, Phuc Hong Pham, Kien Trung Hoang

This paper aims to propose a method to reduce the resistance of silicon-based V-shaped electrothermal microactuator (VEM) by applying a surface sputtering process.

Design of radio frequency power amplifier for 2.45 GHz IoT application using 0.18 µm CMOS technology

Nuha Rhaffor, Wei Keat Ang, Mohamed Fauzi Packeer Mohamed, Jagadheswaran Rajendran, Norlaili Mohd Noh, Mohd Tafir Mustaffa, Mohd Hendra Hairi

The purpose of this study is to show that due to the emergence of the Internet of Things (IoT) industry in recent years, the demand for the higher integration of wireless…

Cover of Microelectronics International

ISSN:

1356-5362

Online date, start – end:

1982

Copyright Holder:

Emerald Publishing Limited

Open Access:

hybrid

Editor:

  • Professor John Atkinson